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Proceedings Paper

Spatial characteristics of laser pulsed plasma deposition of thin films
Author(s): A. A. Gorbunov; Vitali I. Konov
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Paper Abstract

Lately a new film deposition technique — pulsed lase19 plasma vapour deposition (LPVD) — has been rather actively studied One of the main macroscopic features of any thin film deposition technique is distribution of film material on substrate. But this aspect of LPVD technique has been given a little attention. This paper discusses thickness profiles of the films deposited on the substrates by excimer laser plasma vapour deposition (ELPVD). Suggestions have been made concerning improvement of uniformity of the films thickness. Amorphous carbon films obtained by ELPVD technique can be used as protection and anti—reflection coatings for IR optics elements.

Paper Details

Date Published: 1 October 1990
PDF: 5 pages
Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23734
Show Author Affiliations
A. A. Gorbunov, Institute of General Physics (Russia)
Vitali I. Konov, Institute of General Physics (Russia)


Published in SPIE Proceedings Vol. 1352:
1st Intl School on Laser Surface Microprocessing

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