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Proceedings Paper

Deposition of Y-Ba-Cu-O films on silicon subrates
Author(s): Alex G. Akimov; S. A. Kozikov; V. G. Krigel; Anatole N. Khodan; Victor N. Bagratashvili
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Paper Abstract

This work was aimed at studies into the basic physic—chemical processes govern ing the interaction between the Y203-4BaO-6CuO oxidefilm being deposited and the silicon substrate and the chemical stability of the Y Ba Cu 0 film on the surface 1 2 •3 7—x of S13N4 layer deposited on silicon.

Paper Details

Date Published: 1 October 1990
PDF: 11 pages
Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23713
Show Author Affiliations
Alex G. Akimov, Institute of Physical Chemistry (Russia)
S. A. Kozikov, Institute of Physical Chemistry (Russia)
V. G. Krigel, Institute of Physical Chemistry (Russia)
Anatole N. Khodan, Institute of Physical Chemistry (Russia)
Victor N. Bagratashvili, Research Ctr. for Laser Technology (Russia)


Published in SPIE Proceedings Vol. 1352:
1st Intl School on Laser Surface Microprocessing
Ian W. Boyd; Vitali I. Konov; Boris S. Luk'yanchuk, Editor(s)

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