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Proceedings Paper

Laser projection UV lithography on subliming resists
Author(s): Eduard I. Tochitsky; Anatoly I. Sharendo; Victor V. Boksha
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Paper Abstract

One of the alldry microlithographic processes is considered which includes only two operat ions namely vacuum thermal evaporat ion of the res i st f i lm and subsequent patterning of the mask directly during exposure with laser radiation of A 266 nm. The mask patterning is performed on a projection lithography apparatus. Theoreticaland experimental results indicate that the proposed process permits formation of submicron features with high accuracy and relatively low requirements to the exposure dose control. 1 .

Paper Details

Date Published: 1 October 1990
PDF: 8 pages
Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23706
Show Author Affiliations
Eduard I. Tochitsky, Institute of Electronics (Belarus)
Anatoly I. Sharendo, Institute of Electronics (Belarus)
Victor V. Boksha, Institute of Electronics (Belarus)

Published in SPIE Proceedings Vol. 1352:
1st Intl School on Laser Surface Microprocessing
Ian W. Boyd; Vitali I. Konov; Boris S. Luk'yanchuk, Editor(s)

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