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Proceedings Paper

Deposition of oxide thin films on silicon using organic self-assembled monolayers
Author(s): Mark R. DeGuire; Hyunjung Shin; R. J.C. Collins; Monika Agarwal; Chaim N. Sukenik; Arthur H. Heuer
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Paper Abstract

Crystalline oxide thin films have been synthesized at low temperatures from aqueous liquid solutions. A key element of the approach is the use of organic self-assembled monolayers (SAMs) on the substrate to promote the growth of adherent inorganic films. A SAM is a close- packed, highly ordered array of long-chain hydrocarbon molecules, anchored to the substrate by covalent bonds. The terminating functional group on the SAM surface is chosen so as to initiate and help sustain the formation of the oxide film when the substrate is immersed in the oxide precursor solution. Synthesis, microstructural characterization, and properties of TiO2, ZrO2, SiO2, and Y2O3 films are surveyed. Crystalline films were formed either directly from solution, or through subsequent heat treatments at temperatures that in most cases were lower than typical sol-gel or vapor phase deposition processes. All depositions were from aqueous solutions onto single-crystal (100) silicon. The ability to produce patterned films on a micron scale has been demonstrated, taking advantage of the selective deposition characteristics towards different surface functional groups of the SAM. The role of the SAM in oxide film formation is discussed.

Paper Details

Date Published: 25 March 1996
PDF: 12 pages
Proc. SPIE 2686, Integrated Optics and Microstructures III, (25 March 1996); doi: 10.1117/12.236127
Show Author Affiliations
Mark R. DeGuire, Case Western Reserve Univ. (United States)
Hyunjung Shin, Case Western Reserve Univ. (United States)
R. J.C. Collins, Case Western Reserve Univ. (United States)
Monika Agarwal, Case Western Reserve Univ. (United States)
Chaim N. Sukenik, Case Western Reserve Univ. (United States)
Arthur H. Heuer, Case Western Reserve Univ. (United States)

Published in SPIE Proceedings Vol. 2686:
Integrated Optics and Microstructures III
Massood Tabib-Azar, Editor(s)

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