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Proceedings Paper

Applications of neural networks in IC lithography
Author(s): Manisha Mahendra; Thomas F. Krile
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Paper Abstract

This paper will present two types of neural networks applied to IC lithography: the feedforward network with backpropagation and the abductive information modeling (polynomial) network. The inputs are various desired photoresist mask patterns while the corresponding outputs are the parameters that are used to generate these patterns. Results are shown for the 1D case with three exposures made while varying different combinations of two of the three parameters, amplitude, period and phase. Tradeoffs between the two types of networks when applied to this application are discussed.

Paper Details

Date Published: 22 March 1996
PDF: 11 pages
Proc. SPIE 2760, Applications and Science of Artificial Neural Networks II, (22 March 1996); doi: 10.1117/12.235960
Show Author Affiliations
Manisha Mahendra, Texas Tech Univ. (United States)
Thomas F. Krile, Texas Tech Univ. (United States)


Published in SPIE Proceedings Vol. 2760:
Applications and Science of Artificial Neural Networks II
Steven K. Rogers; Dennis W. Ruck, Editor(s)

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