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Proceedings Paper

Design and fabrication of x-ray/EUV optics for photoemission experimental beam line at Hefei National Synchrotron Radiation Lab.
Author(s): Changxin Zhou; Deming Sun
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Paper Abstract

All optics for five beam lines of Hefei National Synchrotron Radiation Laboratory the second synchrotron accelerator of Chinabuiltsuccessfully are designed and fab ricated almost by Changchun Institute of Opticsand Fine Mechanics. One of five beam lines is a Photoemission experimental beamline. Its optical system consists of two sets of spherical mirrors a spherical grating monochromator and two cylindrical ml rrors. Energy covering range of the system is lOeVl000eV. This paper describts de sign and fabrication of two sets of mirrors with large radii (89meter and 5lrneter). Dimension of fabricated surface of optics is 310X60 mm surface roughness of it Is less than bA RMS figuring accuracy of it is )/1 0 The system operats at bA-i iooA and grazing incidence angle Is 3 degrees. All optics are made of Zerodur. Vertical and horizontal acceptance angles are 2. 5mrad and 20 mrad. respectively. Four mirrors with the same radius (89t of five mirror are arranged straight in a row along the length. The mirrors are able to be used as a toroidal mirror with large dimension (4x3lOmrn) as relative positions of them are adjusted respectively. The design idea of the optical system has novel and unique feature. Fabrication of all xray/EUV op tics for beamline can meet requirements as mentiond above and the optlca have been assembled successfully in the synchrotron radiation beamline and used for photo emission experiment.

Paper Details

Date Published: 1 January 1991
PDF: 7 pages
Proc. SPIE 1345, Advanced X-Ray/EUV Radiation Sources and Applications, (1 January 1991); doi: 10.1117/12.23323
Show Author Affiliations
Changxin Zhou, Changchun Institute of Optics and Fine Mechanics (China)
Deming Sun, Institute of High Energy Physics (China)


Published in SPIE Proceedings Vol. 1345:
Advanced X-Ray/EUV Radiation Sources and Applications
James P. Knauer; Gopal K. Shenoy, Editor(s)

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