Share Email Print

Proceedings Paper

CK-MASK semi-manual tool for mask inspection and blowing
Author(s): Andrea Leserri; Francesco Ferrario; Umberto Iessi; Andrea Gusmini
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.

Paper Details

Date Published: 19 September 2018
PDF: 6 pages
Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750E (19 September 2018); doi: 10.1117/12.2326607
Show Author Affiliations
Andrea Leserri, STMicroelectronics SRL (Italy)
Francesco Ferrario, STMicroelectronics SRL (Italy)
Umberto Iessi, STMicroelectronics SRL (Italy)
Andrea Gusmini, Gusmini Attrezzature Industriali (Italy)

Published in SPIE Proceedings Vol. 10775:
34th European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

© SPIE. Terms of Use
Back to Top