Share Email Print
cover

Proceedings Paper

A dual-bandwidth multilayer monochromator system
Author(s): Ali Khounsary; Raymond Conley; Albert Macrander; Reno Waswil; Thomas Irving; Carlo U. Segre
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper reports on a planned upgrade to the capabilities of the Illinois Institute of Technology’s BioCAT undulator beamline in an effort to increase the photon flux 10 to 100-fold. This is accomplished by the addition of a double multilayer monochromator (MLM) system complementing the existing cryogenically-cooled double crystal silicon monochromator system. The water-cooled MLMs are designed and fabricated with each having two coated stripes to deliver a 12 keV undulator beam with either 1.0% or 0.5% energy bandwidths (BW). To simplify the mechanical design and operation of the MLM system, the two coatings have been designed with the same period thickness so that the BW selection is accomplished (at the same Bragg angle) by a mere horizontal translation of the MLMs. The challenge has been to find a pair of coatings that provide the desired BWs with high reflectivity at the same incident angle. This was achieved using MoSi2/B4C and Mo/MoSi2/B4C/MoS2 multilayers at an angle of 1.194°. The bandwidths and reflectivities attained are 0.52 and 83.33% for the former and 0.86 and 75.9% for the latter. Details are provided.

Paper Details

Date Published: 17 September 2018
PDF: 8 pages
Proc. SPIE 10760, Advances in X-Ray/EUV Optics and Components XIII, 107600J (17 September 2018); doi: 10.1117/12.2324824
Show Author Affiliations
Ali Khounsary, Illinois Institute of Technology (United States)
Ctr. for Synchrotron Radiation Research and Instrumentation (United States)
Raymond Conley, Argonne National Lab. (United States)
Albert Macrander, Argonne National Lab. (United States)
Reno Waswil, Illinois Institute of Technology (United States)
Thomas Irving, Illinois Institute of Technology (United States)
Ctr. for Synchrotron Radiation Research and Instrumentation (United States)
Carlo U. Segre, Illinois Institute of Technology (United States)
Ctr. for Synchrotron Radiation Research and Instrumentation (United States)


Published in SPIE Proceedings Vol. 10760:
Advances in X-Ray/EUV Optics and Components XIII
Shunji Goto; Christian Morawe; Ali M. Khounsary, Editor(s)

© SPIE. Terms of Use
Back to Top