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Performance validation of Mapper FLX-1200
Author(s): Jonathan Pradelles; Yoann Blancquaert; Stefan Landis; Laurent Pain; Guido Rademaker; Isabelle Servin; Guido de Boer; Pieter Brandt; Michel Dansberg; Remco Jager; Jerry Peijster; Erwin Slot; Stijn Steenbrink; Marco Wieland
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Paper Abstract

Operating maskless, massively parallel electron beam direct write (MEBDW) is an attractive alternative to optical lithography in micro and nano device manufacturing. Mapper Lithography develops MEBDW tools able to pattern wafers, for application nodes down to 28nm, with a throughput around one wafer per hour. A prototype tool from this series, named FLX-1200, is installed in the CEA-Leti clean room. This paper reviews the current performances of this prototype and the methodology used to measure them. On standardized exposure, consisting of 100 fields of 5×5mm2 exposed, in less than one hour, on 300mm silicon wafers, we obtained CD uniformity below 10nm (3σ) and LWR of 4.5nm for 60nm half pitch dense lines. We also demonstrate capability of 15nm and 25nm (3σ) for stitching and overlay errors respectively.

Paper Details

Date Published: 19 September 2018
PDF: 9 pages
Proc. SPIE 10775, 34th European Mask and Lithography Conference, 1077507 (19 September 2018); doi: 10.1117/12.2324054
Show Author Affiliations
Jonathan Pradelles, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Yoann Blancquaert, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Stefan Landis, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Laurent Pain, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Guido Rademaker, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Isabelle Servin, Univ. Grenoble Alpes, CEA, LETI, DTSI, Lithography Lab. (France)
Guido de Boer, MAPPER Lithography (Netherlands)
Pieter Brandt, MAPPER Lithography (Netherlands)
Michel Dansberg, MAPPER Lithography (Netherlands)
Remco Jager, MAPPER Lithography (Netherlands)
Jerry Peijster, MAPPER Lithography (Netherlands)
Erwin Slot, MAPPER Lithography (Netherlands)
Stijn Steenbrink, MAPPER Lithography (Netherlands)
Marco Wieland, MAPPER Lithography (Netherlands)


Published in SPIE Proceedings Vol. 10775:
34th European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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