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Proceedings Paper

eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements
Author(s): Aki Fujimura; Jan Willis
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Paper Abstract

The eBeam Initiative completed its third annual mask makers’ survey in 2017 with anonymous feedback from 10 captive and merchant photomask manufacturers. Participation in the 2017 eBeam Initiative perceptions survey increased to more than 40 different companies versus 30 companies the previous year. In 2017, 75 industry luminaries responded from across the semiconductor ecosystem.

Paper Details

Date Published: 12 June 2018
PDF: 7 pages
Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070C (12 June 2018); doi: 10.1117/12.2323961
Show Author Affiliations
Aki Fujimura, D2S, Inc. (United States)
Jan Willis, eBeam Initiative (United States)


Published in SPIE Proceedings Vol. 10807:
Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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