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Proceedings Paper

UV plasmonics: materials, methods, and mechanisms (Conference Presentation)
Author(s): Steve Blair
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Paper Abstract

There is growing research interest in UV plasmonics, in part because the UV regime has seen comparatively little activity compared to the visible, NIR/IR, and THz regimes, but also because of application areas such as UV sources and detectors, label-free fluorescence detection of biomolecules, and photocatalysis. There is a rich spectrum of materials that exhibit plasmonic response in the UV. Although no single material can be considered the “best” for all applications, Al is the most often utilized. Our research has focused on Al, Mg, Ga, and their alloys. We have developed deposition methods and top-down and bottom-up patterning methods, and utilized materials analysis methods to gain understanding of the UV plasmonic response of these materials. We have also enabled materials such as Mg and Ga to be used in applications such as enhanced fluorescence. Studies of native fluorescence modification from Al and Mg plasmonic structures show some key differences between the two materials, which I will explain. I will also discuss some plasmonic structures that exhibit very large UV enhancements, some of which can be readily fabricated by nanosphere lithography methods.

Paper Details

Date Published: 17 September 2018
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Proc. SPIE 10727, UV and Higher Energy Photonics: From Materials to Applications 2018, 107270C (17 September 2018); doi: 10.1117/12.2323646
Show Author Affiliations
Steve Blair, The Univ. of Utah (United States)


Published in SPIE Proceedings Vol. 10727:
UV and Higher Energy Photonics: From Materials to Applications 2018
Gilles Lérondel; Satoshi Kawata; Yong-Hoon Cho, Editor(s)

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