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Photochemistry of common spacecraft outgassing contaminants: a review (Conference Presentation)
Author(s): Abraham Buditama
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Paper Abstract

Molecular contamination of optical surfaces, thermal control components, or other spacecraft components can lead to end-of-life performance degradation. In particular, exposure to vacuum ultraviolet (VUV) radiation is known to enhance contaminant deposition rates. Known mechanisms for photodeposition and photopolymerization of contaminants are here reviewed to provide insight into the underlying chemistry and reaction mechanisms. Previous works have shown that many variables influence the rate of contaminant uptake, including temperature, VUV energy, and material properties of both the contaminant molecules and the substrate. Additionally, the photochemistries of three common spacecraft outgassing contaminants (DOP, BPA, and DC 704) are discussed to provide insight into future modeling efforts.

Paper Details

Date Published: 18 September 2018
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Proc. SPIE 10748, Systems Contamination: Prediction, Control, and Performance 2018, 1074802 (18 September 2018); doi: 10.1117/12.2322676
Show Author Affiliations
Abraham Buditama, The Aerospace Corp. (United States)


Published in SPIE Proceedings Vol. 10748:
Systems Contamination: Prediction, Control, and Performance 2018
Carlos E. Soares; Eve M. Wooldridge; Bruce A. Matheson, Editor(s)

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