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Proceedings Paper

Design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission
Author(s): Dennis P. Atkinson; Jay V. Bixler; Paul Geraghty; Charles J. Hailey; Jeffrey L. Klingmann; Richard C. Montesanti; Steven M. Kahn; Frits B. S. Paerels
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Paper Abstract

The Reflection Grating Spectrometer Experiment (RGS), which has been selected for flight on the European Space Agency's X-Ray Multi-Mirror Mission (XMM), includes two arrays of reflection gratings that are placed in the X-ray optical path behind two separate grazing incidence X-ray telescopes. Each of the grating arrays picks off roughly half the X-ray light emanating from its telescope and diffracts it to a dedicated strip of charge-coupled device (CCD) detectors offset from the telescope focal plane. The arrays contain 224 100 mm X 200 mm gratings, each mounted at a graze angle of 1.58° to the incident beam. The gratings are produced by epoxy replication of a common master onto very thin substrates. Both the gratings and the detectors are mounted on a Rowland circle which also includes the telescope focus. In this paper, we review the current state of both the engineering and the optical designs for the grating arrays.

Paper Details

Date Published: 1 February 1991
PDF: 12 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23226
Show Author Affiliations
Dennis P. Atkinson, Lawrence Livermore National Lab. (United States)
Jay V. Bixler, Lawrence Livermore National Lab. (United States)
Paul Geraghty, Lawrence Livermore National Lab. (United States)
Charles J. Hailey, Lawrence Livermore National Lab. (United States)
Jeffrey L. Klingmann, Lawrence Livermore National Lab. (United States)
Richard C. Montesanti, Lawrence Livermore National Lab. (United States)
Steven M. Kahn, Univ. of California/Berkeley (United States)
Frits B. S. Paerels, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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