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Proceedings Paper

Silicate glass film deposition from gas discharge initiated by laser plasma
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Paper Abstract

Investigations devoted to the silicate glass film deposition from gas discharge initiated by laser plasma are presented. Tetraethylorthosilicate (TEOS) is introduced in the gas composition. It was the source of the SiO2. Addition of the other components of the deposited coatings comes from the laser plume of the ablated solid state target.

Paper Details

Date Published: 11 March 1996
PDF: 4 pages
Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); doi: 10.1117/12.232211
Show Author Affiliations
Valerie A. Astapenko, Moscow Institute of Physics and Technology (Russia)
Oleg E. Sidoryuk, Research Institute Polus (Russia)


Published in SPIE Proceedings Vol. 2777:
ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics
Alexander M. Prokhorov; Vladimir I. Pustovoy, Editor(s)

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