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Proceedings Paper

Multilayer deposition and nanostructuring by laser methods
Author(s): Andre A. Gorbunov; Wolfgang Pompe; Andreas Sewing; A. D. Akhsakhaljan; Sergey V. Gaponov; Nikolai N. Salashchenko; Reiner Dietsch; Hermann Mai; S. Voellmar
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Paper Abstract

A high vacuum pulsed laser deposition system is described where an intersection of two ablation plumes from twinned simultaneously irradiated targets is used. This system allows thin film and multilayer deposition of a wide variety of materials (including low melting point metals like tin) practically without droplet contamination. The intersection region acts as a filter for droplets and high energy plasma particles. The use of twinned targets of different materials facilitates preparation of artificially mixed supersaturated thin film solid state solutions used as a media for sub-micrometer and nanometer-scale surface processing. Special design of the target holder that can carry simultaneously up to 24 targets and computer control of the deposition process make it possible to easily change targets without venting the deposition chamber and to deposit arbitrary multilayer combinations of various materials.

Paper Details

Date Published: 11 March 1996
PDF: 12 pages
Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); doi: 10.1117/12.232206
Show Author Affiliations
Andre A. Gorbunov, Max-Planck-Arbeitsgruppe (Germany)
Wolfgang Pompe, Max-Planck-Arbeitsgruppe (Germany)
Andreas Sewing, Max-Planck-Arbeitsgruppe (Germany)
A. D. Akhsakhaljan, Institute for Physics of Microstructures (Russia)
Sergey V. Gaponov, Institute for Physics of Microstructures (Russia)
Nikolai N. Salashchenko, Institute for Physics of Microstructures (Russia)
Reiner Dietsch, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Hermann Mai, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
S. Voellmar, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)


Published in SPIE Proceedings Vol. 2777:
ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics
Alexander M. Prokhorov; Vladimir I. Pustovoy, Editor(s)

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