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Proceedings Paper

The ALS OSMS: Optical Surface Measuring System for high accuracy two-dimensional slope metrology with state-of-the-art x-ray mirrors
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Paper Abstract

To preserve the brightness and coherence of x-rays produced by diffraction-limited-storage-ring (DLSR) and free-electron- laser (FEL) light sources, beamline optics must have unprecedented quality. For example, in the case of the most advanced beamlines for the DLSR source under development at the Advanced Light Source (ALS), the ALS-U, we need highly curved x-ray mirrors with surface slope tolerances better than 50–100 nrad (root-mean-square, rms). At the ALS X-Ray Optics Lab (XROL), we are working on the development of a new Optical Surface Measuring System (OSMS) with the required measurement accuracy. The OSMS is capable for the two-dimensional (2D) surface slope metrology over the spatial range from the sub-mm scale to the clear aperture. Usage of different arrangements of the OSMS sensors allows measuring the mirrors in the face-up or side-facing orientation, corresponding to the beamline application. The OSMS translation system and data acquisition software are designed to support multi scan measurement runs optimized for automatic suppression and compensation of instrumental drifts and major angular and spatial systematic errors. Here, we discuss the recent results of the OSMS research and development project. We provide details of the OSMS design and describe results of experimental performance tests of the gantry system. In particular, we show that the system is capable for measurement repeatability with strongly curved mirrors on the level of 20 nrad (rms). The high angular resolution of the OSMS rotational tip-tilt stage is adequate for implementation of instrumental calibration with using the mirror under test as a reference. The achieved measuring accuracy is demonstrated via comparison to metrology with the carefully calibrated Developmental Long Trace Profiler, also available at the XROL.

Paper Details

Date Published: 17 September 2018
PDF: 20 pages
Proc. SPIE 10760, Advances in X-Ray/EUV Optics and Components XIII, 1076002 (17 September 2018); doi: 10.1117/12.2321347
Show Author Affiliations
Ian Lacey, Lawrence Berkeley National Lab. (United States)
Kevan Anderson, Lawrence Berkeley National Lab. (United States)
Gary P. Centers, Lawrence Berkeley National Lab. (United States)
Helmholtz-Institut Mainz (Germany)
Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt (Germany)
Gevork S. Gevorkyan, Lawrence Berkeley National Lab. (United States)
John Grossiord, Institut Univ. de Technologie Le Creusot (France)
Andreas Just, Physikalisch-Technische Bundesanstalt (Germany)
Theo Nicolot, Institut Univ. de Technologie Le Creusot (France)
Brian V. Smith, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 10760:
Advances in X-Ray/EUV Optics and Components XIII
Shunji Goto; Christian Morawe; Ali M. Khounsary, Editor(s)

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