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Proceedings Paper

Interface characterization of XUV multilayer reflectors using HRTEM and x-ray and XUV reflectance
Author(s): David L. Windt; Robert Hull; Warren K. Waskiewicz; Jeffrey B. Kortright
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Paper Abstract

The structure of XUV multilayer coatings has been examined using high-resolution transmission electron microscopy. A variety of techniques have been used to measure the interface widths and the interface topography from the digitized TEM images and the results have been compared with X-ray and XUV reflectance measurements. It is found that the structural parameters measured from the TEM images and those deduced from reflectance are consistent in light of the probable systematic errors associated with the measurement and interpretation techniques.

Paper Details

Date Published: 1 February 1991
PDF: 17 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23202
Show Author Affiliations
David L. Windt, AT&T Bell Labs. (United States)
Robert Hull, AT&T Bell Labs. (United States)
Warren K. Waskiewicz, AT&T Bell Labs. (United States)
Jeffrey B. Kortright, Lawrence Berkeley Lab. (United States)

Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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