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Proceedings Paper

Fabrication and characterization of Si-based soft x-ray mirrors
Author(s): Bernt Schmiedeskamp; Bernhard Heidemann; Ulf Kleineberg; Andreas Kloidt; Mikhael Kuehne; H. Mueller; Peter Mueller; Kerstin Nolting; Ulrich Heinzmann
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Paper Abstract

The fabrication, by electron beam evaporation, of Mo/Si and Ta/Si mutilayers designed as soft-X-ray mirrors is described. The mirrors were characterized using surface analytical methods (RBS and sputtering in combination with AES), Cu-k(alpha) reflection, and soft-X-ray optical methods, and their soft-X-ray optical properties were correlated with microstructural characteristics. A comparison of in situ C-k reflectivity curves with calculations disclosed the existence of roughnesses at the interfaces, which can not be completely described by multiplying the reflected amplitude at each interface by a Debye-Waller factor. It was found that heating of Ta/Si samples induces a considerable change (up to and above 10 percent) in the d-spacing of multilayers, while the reflected amplitude is only reduced to two thirds of its original value.

Paper Details

Date Published: 1 February 1991
PDF: 9 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23179
Show Author Affiliations
Bernt Schmiedeskamp, Univ. Bielefeld (Germany)
Bernhard Heidemann, Univ. Bielefeld (Germany)
Ulf Kleineberg, Univ. Bielefeld (Germany)
Andreas Kloidt, Univ. Bielefeld (Germany)
Mikhael Kuehne, Physikalisch-Technische Bundesanstalt (Germany)
H. Mueller, Univ. Bielefeld (Germany)
Peter Mueller, Physikalisch-Technische Bundesanstalt (Germany)
Kerstin Nolting, Univ. Bielefeld (Germany)
Ulrich Heinzmann, Univ. Bielefeld (Germany)


Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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