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Proceedings Paper

Soft x-ray multilayers fabricated by electron-beam deposition
Author(s): Masaaki Sudoh; Ryouhei Yokoyama; Mitsuo Sumiya; Masaki Yamamoto; Mihiro Yanagihara; Takeshi Namioka
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Paper Abstract

We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures of room temperature to 420 °C and at deposition rates of 0.2-10 A/sec were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x-rays of 110-170 A. The optimum deposition parameters were found to be 100-150 °C and 0.2-2 A/sec, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of '3O for unpolarized soft x-ray of 146 A at an incident angle of 200.

Paper Details

Date Published: 1 February 1991
PDF: 11 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23173
Show Author Affiliations
Masaaki Sudoh, Toshiba Corp. (Japan)
Ryouhei Yokoyama, Toshiba Corp. (Japan)
Mitsuo Sumiya, Toshiba Corp. (Japan)
Masaki Yamamoto, Tohoku Univ. (Japan)
Mihiro Yanagihara, Tohoku Univ. (Japan)
Takeshi Namioka, Tohoku Univ. (United States)


Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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