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Proceedings Paper

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)
Author(s): Jacob Sitterly; Michael Murphy; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard
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Paper Abstract

This paper describes the photoreactivity of six organometallic complexes of the type PhnMX2 containing bismuth, antimony and tellurium, where n = 3 for bismuth and antimony and n = 2 for tellurium, and where X = acetate (O2CCH3) or pivalate (O2CC(CH3)3). These compounds were exposed to EUV light to monitor photodecomposition via in situ mass spectral analysis of the primary outgassing products of CO2, benzene and phenol. This paper explores the effect of metal center and carboxylate ligand on the EUV reactivity of these EUV photoresists.

Paper Details

Date Published: 27 March 2018
PDF: 7 pages
Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861P (27 March 2018); doi: 10.1117/12.2316333
Show Author Affiliations
Jacob Sitterly, State Univ. of New York Polytechnic Institute (United States)
Michael Murphy, State Univ. of New York Polytechnic Institute (United States)
Steven Grzeskowiak, State Univ. of New York Polytechnic Institute (United States)
Greg Denbeaux, State Univ. of New York Polytechnic Institute (United States)
Robert L. Brainard, State Univ. of New York Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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