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Proceedings Paper

Recent development of MCP collimators for x-ray lithography of semiconductor devices
Author(s): A. N. Brunton
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Paper Abstract

Soft X-ray collimators , based on established microchannel plate technology1,2, are being developed in order to collimate the expanding beam from a laser-plasma X-ray source3. The collimation results in a parallel beam suitable for X-ray lithography of semiconductor devices such as the 1Gbit DRAM (Fig. 1).

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778G8 (1 September 1996); doi: 10.1117/12.2316273
Show Author Affiliations
A. N. Brunton, Leicester Univ. (United Kingdom)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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