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Proceedings Paper

High average power KrF laser-plasma x-ray source for lithography at 1nm wavelength
Author(s): I. C. E. Turcu
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Paper Abstract

A laser-plasma X-ray source has been developed at the Rutherford Appleton Laboratory for application to x-ray lithography at 0.18μm and beyond, as well as for generation of deep structures. This source provides a calibrated X-ray output of up to 1W (average power) 1nm wavelength (Cu L-shell emission) and 1.5W @ 1.4nm (Fe L-shell)1. Fig. 1 shows a schematic of the RAL laser-plasma x-ray source.

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778G6 (1 September 1996); doi: 10.1117/12.2316271
Show Author Affiliations
I. C. E. Turcu, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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