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Proceedings Paper

Research on high-efficiency polishing technology of photomask substrate
Author(s): Shijie Zhao; Ruiqing Xie; Lian Zhou; Defeng Liao; Xianhua Chen; Jian Wang
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Paper Abstract

A method of photomask substrate fabrication is demonstrated ,that the surface figure and roughness of fused silica will converge to target precision rapidly with the full aperture polishing. Surface figure of optical flats in full aperture polishing processes is primarily dependent on the surface profile of polishing pad, therefor, a improved function of polishing mechanism was put forward based on two axis lapping machine and technology experience, and the pad testing based on displacement sensor and the active conditioning method of the pad is applied in this research. Moreover , the clamping deformation of the thin glass is solved by the new pitch dispensing method. The experimental results show that the surface figure of the 152mm×152mm×6.35mm optical glass is 0.25λ(λ=633nm) and the roughness is 0.32nm ,which has meet the requirements of mask substrate for 90~45nm nodes.

Paper Details

Date Published: 5 March 2018
PDF: 6 pages
Proc. SPIE 10710, Young Scientists Forum 2017, 107102O (5 March 2018); doi: 10.1117/12.2314931
Show Author Affiliations
Shijie Zhao, Chengdu Fine Optical Engineering Research Ctr. (China)
Ruiqing Xie, Chengdu Fine Optical Engineering Research Ctr. (China)
Lian Zhou, Chengdu Fine Optical Engineering Research Ctr. (China)
Defeng Liao, Chengdu Fine Optical Engineering Research Ctr. (China)
Xianhua Chen, Chengdu Fine Optical Engineering Research Ctr. (China)
Jian Wang, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 10710:
Young Scientists Forum 2017
Songlin Zhuang; Junhao Chu; Jian-Wei Pan, Editor(s)

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