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Proceedings Paper

Design, fabrication, and characterisation of wire grid polarizers for the deep UV spectral range
Author(s): Luis Rodríguez-de Marcos; Leong Ong Bin; Teguh Citra Asmara; Sascha Pierre Heussler; Albert Guerrero ; Roser Mas ; Xavier Borrise; Mark B. H. Breese; Andrivo Rusydi
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Paper Abstract

In this communication, we show preliminary results on transmissive TiO2 wire-grid polarizers (WGP) operating in the deep ultraviolet (DUV) range. WGP are devices based on strips of materials with large values of the modulus of the dielectric constant along with high absorption in the operational range. The merit function Π is introduced as a new tool to find the optimum material for WGPs in a given spectral range. The experimental dielectric constant of TiO2 thin films deposited by pulsed laser deposition are obtained through spectroscopic ellipsometry, and the Π function indicates that TiO2 is the best candidate for WGP in the DUV range when it is compared with other oxides. Once the material selection for WGP is done, we present and compare two different design approaches for WGP: one using an effective medium theory for the periodic structure, and the second using finite-difference time-domain (FDTD) analysis. A prototype of WGP is fabricated by electron beam (e-beam) lithography followed by lift-off process; the topography of the sample is analyzed by AFM, and we found noticeable deviations in the grating from the designed values. In preliminary characterization work the effective dielectric constant in two perpendicular orientations is obtained by ellipsometry and the contrast is compared with the design.

Paper Details

Date Published: 5 June 2018
PDF: 15 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069124 (5 June 2018); doi: 10.1117/12.2314459
Show Author Affiliations
Luis Rodríguez-de Marcos, National Univ. of Singapore (Singapore)
Leong Ong Bin, National Univ. of Singapore (Singapore)
Teguh Citra Asmara, National Univ. of Singapore (Singapore)
Sascha Pierre Heussler, National Univ. of Singapore (Singapore)
Albert Guerrero , Instituto de Microelectrónica de Barcelona (Spain)
Roser Mas , Instituto de Microelectrónica de Barcelona (Spain)
Xavier Borrise, Catalan Institute of Nanoscience and Nanotechnology (Spain)
Mark B. H. Breese, National Univ. of Singapore (Singapore)
Andrivo Rusydi, National Univ. of Singapore (Singapore)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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