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Low-temperature atomic layer deposition of aluminum oxide scaled up to a 36” chamber for observatory optics
Author(s): David M. Fryauf; Andrew C. Phillips; Michael J. Bolte; Aaron Feldman; Gary S. Tompa; Nobuhiko P. Kobayashi
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Paper Abstract

A new atomic layer deposition (ALD) tool has been designed, constructed, and tested to apply uniform protective coatings over a substrate 36” in diameter. The new tool, named the meter-scale ALD system (MSAS), employs a novel chamber design which utilizes a large substrate to be coated as a wall of the chamber. Conceptual design and implementation of this new tool are discussed with potential applications to large astronomical telescope optics, specifically protective coatings for silver mirrors, and other future large structures. In this work, aluminum oxide was deposited by thermal ALD using trimethylaluminum and water at a low reaction temperature of 60°C. Thickness uniformity across a 36” substrate is within 2.5% of the average film thickness. MSAS aluminum oxide deposition process parameters are compared with those of a conventional 4” wafer-scale ALD tool. The results show promising application of transparent robust dielectric films as uniform barriers across large optical components as well as multiple wafer assemblies encountered in semiconductor processing.

Paper Details

Date Published: 10 July 2018
PDF: 12 pages
Proc. SPIE 10706, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III, 107065D (10 July 2018); doi: 10.1117/12.2314151
Show Author Affiliations
David M. Fryauf, Univ. of California, Santa Cruz (United States)
Andrew C. Phillips, Univ. of California Observatories (United States)
Michael J. Bolte, Univ. of California Santa Cruz (United States)
Aaron Feldman, Structured Materials Industries, Inc. (United States)
Gary S. Tompa, Structured Materials Industries, Inc. (United States)
Nobuhiko P. Kobayashi, Univ. of California, Santa Cruz (United States)

Published in SPIE Proceedings Vol. 10706:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III
Ramón Navarro; Roland Geyl, Editor(s)

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