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Phase-induced amplitude apodization complex-mask coronagraph tolerancing and analysis
Author(s): Justin M. Knight; Olivier Guyon; Julien Lozi; Nemanja Jovanovic; Jared R. Males
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Paper Abstract

Phase-Induced Amplitude Apodization Complex Mask Coronagraphs (PIAACMC) offer high-contrast performance at a small inner-working angle (< 1 λ/D) with high planet throughput (> 70%). The complex mask is a multi-zone, phase-shifting mask comprised of tiled hexagons which vary in depth. Complex masks can be difficult to fabricate as there are many micron-scale hexagonal zones (> 500 on average) with continuous depths ranging over a few microns. Ensuring the broadband PIAACMC design performance carries through to fabricated devices requires that these complex masks are manufactured to within well-defined tolerances. We report on a simulated tolerance analysis of a "toy" PIAACMC design which characterizes the effect of common microfabrication errors on on-axis contrast performance using a simple Monte Carlo method. Moreover, the tolerance analysis provides crucial information for choosing a fabrication process which yields working devices while potentially reducing process complexity. The common fabrication errors investigated are zone depth discretization, zone depth errors, and edge artifacts between zones.

Paper Details

Date Published: 10 July 2018
PDF: 8 pages
Proc. SPIE 10706, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III, 107065O (10 July 2018); doi: 10.1117/12.2314139
Show Author Affiliations
Justin M. Knight, College of Optical Sciences, The Univ. of Arizona (United States)
Steward Observatory (United States)
Olivier Guyon, The Univ. of Arizona (United States)
Subaru Telescope (United States)
Julien Lozi, Subaru Telescope, National Astronomical Observatory of Japan (United States)
Nemanja Jovanovic, Caltech Optical Observatory (United States)
Jared R. Males, Steward Observatory, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 10706:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III
Ramón Navarro; Roland Geyl, Editor(s)

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