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Reproducibility and stability of nanoporous SiO2 thin film coatings
Author(s): L. Ghazaryan; A. Szeghalmi
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Paper Abstract

In this study, single layer antireflection (AR) coatings have been realized using nanoporous SiO2 thin films made by atomic layer deposition (ALD) and wet chemical etching. The run-to-run and etch-to-etch reproducibility of nanoporous coatings have been monitored nearly one year. Excellent reproducibility of the film thickness and refractive index, and accordingly of the optical function are demonstrated. Furthermore, the stability of the coatings in vacuum as well as at 200°C has been analyzed.

Paper Details

Date Published: 5 June 2018
PDF: 7 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069110 (5 June 2018); doi: 10.1117/12.2313847
Show Author Affiliations
L. Ghazaryan, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institute for Applied Optics and Precision Engineering IOF (Germany)
A. Szeghalmi, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institute for Applied Optics and Precision Engineering IOF (Germany)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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