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Proceedings Paper

Forming an ultrathin and lightweight Wolter type-1 x-ray micropore optics into a single substrate
Author(s): K. Nomoto; R. Hata; K. Doi; Y. Nawaki; D. Yajima; R. Furuya; K. Shinoda; K. Tsuruoka; H. Kodaka
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Paper Abstract

In this paper, we propose a new glass Micropore Optics (MPO), which forms a Wolter type-1 optical system into a single glass substrate without bending or alignment. We call this new X-ray condenser mirror as NXCM. In recent years, lightweight and high-productivity X-ray optics have been demanded for small satellite and detector calibration. We aim to develop a high-performance X-ray MPO by applying our fine patterning and design techniques on the basis of semiconductor-based micromachining technologies. Generally, reducing process steps and cutting out error factors make “productivity” and “resolution” better. It has been expected to form a Wolter type-1 optics directly on a base substrate. Therefore, we focused on the process technology using femtosecond laser irradiation and wet etching, which can form arbitrary fine three-dimensional structure in glass substrate, and applied this technology to MPO fabrication. Using this technique, we successfully achieved to form the two-step oblique grooves machining of 1.7 degrees in the primary stage and 5.1 degrees in the secondary stage with groove widths of 20 μm and 40 μm to the flat glass t 0.5 mm. The groove structure was confirmed by cross-sectional image. The surface roughness of the groove side wall serving as the X-ray reflection surface is expected to be improved by the better scanning of femtosecond laser and the magnetic fluid polishing process. Based on the results, we are proceeding with the production of a condenser mirror prototype while optimizing the coating process and polishing process. In this paper, we report the simulation result of focusing performance and the achievement of the fabrication process in consideration of machining accuracy and error factors. With this method, the higher aspect structure is achieved by stacking several substrates in the optical axis direction or the large area structure is achieved by tiling in the plane direction. The various types of optical structure can be considered with this method.

Paper Details

Date Published: 17 September 2018
PDF: 11 pages
Proc. SPIE 10760, Advances in X-Ray/EUV Optics and Components XIII, 107600A (17 September 2018); doi: 10.1117/12.2313125
Show Author Affiliations
K. Nomoto, Ushio Inc. (Japan)
R. Hata, Ushio Inc. (Japan)
K. Doi, Ushio Inc. (Japan)
Y. Nawaki, Ushio Inc. (Japan)
D. Yajima, Ushio Inc. (Japan)
R. Furuya, Ushio Inc. (Japan)
K. Shinoda, Ushio Inc. (Japan)
K. Tsuruoka, Ushio Inc. (Japan)
H. Kodaka, Ushio Inc. (Japan)


Published in SPIE Proceedings Vol. 10760:
Advances in X-Ray/EUV Optics and Components XIII
Shunji Goto; Christian Morawe; Ali M. Khounsary, Editor(s)

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