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Improvement to the LIDT of high-reflection coatings by planarization of nodular defects
Author(s): Lingyun Xie; Tao He; Jinlong Zhang; Hongfei Jiao; Bin Ma; Zhanshan Wang; Xinbin Cheng
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Paper Abstract

Planarization of nodular defects was investigated in order to improve the laser-induced damage threshold (LIDT) of high-reflection coatings. Monodisperse SiO2 microspheres were first deposited on the substrate surface by a spin coating process. Using a dual ion beam sputtering system, these engineered seeds were used to create artificial nodules in 1064nm HfO2/SiO2 high-reflection coatings and Ta2O5/SiO2 high-reflection coatings. These SiO2 microspheres were then smoothed by a single thick SiO2 planarization layer, where the relationship between the thickness of the planarization layer and the size of the microspheres was investigated. When the planarization layer (etching layer) thickness is slightly larger than the diameter of the seeds, the seeds could be completely planarized to obtain smooth thin films. In addition, the LIDT of the high-reflection coatings with different coating materials and different planarization layer thicknesses were tested. The results showed that the nodular defects planarization could noticeably improve the damage resistance of high- reflection coatings. In addition, the surface roughness of Ta2O5/SiO2 high-reflection coatings was shown to decrease after the planarization, while the surface roughness of the 1064nm HfO2/SiO2 high-reflection coatings was shown to increase.

Paper Details

Date Published: 5 June 2018
PDF: 8 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911P (5 June 2018); doi: 10.1117/12.2312418
Show Author Affiliations
Lingyun Xie, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Tao He, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Jinlong Zhang, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Hongfei Jiao, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Bin Ma, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Zhanshan Wang, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)
Xinbin Cheng, MOE Key Lab. of Advanced Micro-Structured Materials (China)
Tongji Univ. (China)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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