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Optimal design and fabrication of multilayer antireflection coating for III-V quadruple-junction solar cells
Author(s): Siyu Dong; Hongfei Jiao; Jinlong Zhang; Yiming Zhao; Jing Li; Zhanshan Wang; Xinbin Cheng
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Paper Abstract

Optimal solution for the multilayers AR coating of 4J solar cell including design and fabrication was investigated. The real layer structure of 4J solar cell was determined first through reverse fitting, then the multilayers AR coating could be designed on the complete 4J solar cell to find the global optimization. After clarifying that the performance of multilayers AR coating is affected by oxidation of AlInP, the oxide layer was characterized and compensated to improve the spectrum. Through transmission electron microscopy (TEM), the oxidation depth was determined to be 5nm. Finally, the multilayers AR coating was re-optimized by considering oxidation layer into 4J solar cell. Using ion assisted deposition, the multilayers AR coating was fabricated with a slightly increased weight average reflectance of only 0.5%.

Paper Details

Date Published: 5 June 2018
PDF: 6 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911F (5 June 2018); doi: 10.1117/12.2312065
Show Author Affiliations
Siyu Dong, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Hongfei Jiao, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Jinlong Zhang, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Shanghai Jiao Tong Univ. (China)
Yiming Zhao, Beijing Research Institute of Telemetry (China)
Jing Li, Beijing Research Institute of Telemetry (China)
Zhanshan Wang, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Shanghai Jiao Tong Univ. (China)
Xinbin Cheng, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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