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Proceedings Paper

Time resolved detection of particle contamination during thin film deposition
Author(s): Anna Karoline Rüsseler; Istvan Balasa; Hans-Ulrich Kricheldorf; Michael Vergöhl; Lars Jensen; Detlev Ristau
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Paper Abstract

Particle contamination is a limiting factor for the quality of multilayer thin films, and to evaluate this effect, coated optics are typically subjected to an ex situ inspection. However, to identify the generation mechanisms of particles during the deposition process, it is necessary to record data in situ. In this work we report on a camera based detection method for time resolved particle measurements during plasma deposition processes. We analyze silicon substrates in the vacuum coating chamber by means of dark field illumination to reach high sensitivity to small defects on the substrate surface. We show camera images of the substrate, which document the evolution of particle contamination during the deposition process, and compare the results to microscopy. By providing a cost-efficient monitoring strategy, we take the steps towards an identification of particle sources in the vacuum chamber.

Paper Details

Date Published: 5 June 2018
PDF: 9 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106910H (5 June 2018); doi: 10.1117/12.2309918
Show Author Affiliations
Anna Karoline Rüsseler, Laser Zentrum Hannover e.V. (Germany)
Istvan Balasa, Laser Zentrum Hannover e.V. (Germany)
Hans-Ulrich Kricheldorf, Fraunhofer-Institut für Schicht- und Oberflächentechnik (Germany)
Michael Vergöhl, Fraunhofer-Institut für Schicht- und Oberflächentechnik (Germany)
Lars Jensen, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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