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Proceedings Paper

Ion beam lithography preparation of the transparent conductive film of metal grating
Author(s): Song-lin Wang; Gao-yuan Mi; Chong-min Yang; Jian-fu Zhang; Ying-hui Wang; Qing-long Liu; Ming-wei Li
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Paper Abstract

Transparent conductive films of metal grating have been prepared by ion beam lithography method. The surface appearance and thickness of films were measured by atomic force microscope (AFM). Metal grating thickness uniformity has been improved to 2.34% when the flap was used to correction. Visible and near-infrared transparent have been measured by Lambda 900 spectrophotometer.

Paper Details

Date Published: 5 March 2018
PDF: 7 pages
Proc. SPIE 10710, Young Scientists Forum 2017, 107100K (5 March 2018); doi: 10.1117/12.2307486
Show Author Affiliations
Song-lin Wang, Xi'an Institute of Applied Optics (China)
Gao-yuan Mi, Xi'an Institute of Applied Optics (China)
Chong-min Yang, Xi'an Institute of Applied Optics (China)
Jian-fu Zhang, Xi'an Institute of Applied Optics (China)
Ying-hui Wang, Xi'an Institute of Applied Optics (China)
Qing-long Liu, Xi'an Institute of Applied Optics (China)
Ming-wei Li, Xi'an Institute of Applied Optics (China)


Published in SPIE Proceedings Vol. 10710:
Young Scientists Forum 2017
Songlin Zhuang; Junhao Chu; Jian-Wei Pan, Editor(s)

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