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Proceedings Paper

Lithographic diffraction grating with a period failure
Author(s): M. V. Shishova; A. Y. Zherdev; S. B. Odinokov; D. S. Lushnikov
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Paper Abstract

That paper focuses on diffraction gratings consisting some period failures provided by the errors of the electronbeam lithography method. Samples of lithographic phase gratings were tentatively analyzed to describe that technological errors. A small linear modulation of the period or a joint of a frame edges can cause not only diffraction efficiency losses but also functional breakdown. A simulation of the diffraction of a monochromatic wave at the described diffraction phase structures is carried out. Described diffraction gratings have interest in field of linear displacement encoders.

Paper Details

Date Published: 24 May 2018
PDF: 8 pages
Proc. SPIE 10678, Optical Micro- and Nanometrology VII, 106780E (24 May 2018); doi: 10.1117/12.2306811
Show Author Affiliations
M. V. Shishova, Bauman Moscow State Technical Univ. (Russian Federation)
A. Y. Zherdev, Bauman Moscow State Technical Univ. (Russian Federation)
S. B. Odinokov, Bauman Moscow State Technical Univ. (Russian Federation)
D. S. Lushnikov, Bauman Moscow State Technical Univ. (Russian Federation)


Published in SPIE Proceedings Vol. 10678:
Optical Micro- and Nanometrology VII
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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