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Proceedings Paper

LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction
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Paper Abstract

Mask registration data are presented, which demonstrate local errors that can be correlated to writing swathes of state-of-the-art e-beam writers and multi-pass strategies. A unique measurement methodology, Local Registration Metrology, allows for dense sampling of reticle dies to characterize the local e-beam registration error and enables e-beam corrections via feed forward.

Paper Details

Date Published: 13 March 2018
PDF: 6 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851V (13 March 2018); doi: 10.1117/12.2303959
Show Author Affiliations
Hendrik Steigerwald, KLA-Tencor MIE GmbH (Germany)
Oliver Ache, KLA-Tencor MIE GmbH (Germany)
Runyuan Han, KLA-Tencor MIE GmbH (Germany)
Frank Laske, KLA-Tencor MIE GmbH (Germany)
Klaus-Dieter Roeth , KLA-Tencor MIE GmbH (Germany)

Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

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