Share Email Print
cover

Proceedings Paper

LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Mask registration data are presented, which demonstrate local errors that can be correlated to writing swathes of state-of-the-art e-beam writers and multi-pass strategies. A unique measurement methodology, Local Registration Metrology, allows for dense sampling of reticle dies to characterize the local e-beam registration error and enables e-beam corrections via feed forward.

Paper Details

Date Published: 13 March 2018
PDF: 6 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851V (13 March 2018); doi: 10.1117/12.2303959
Show Author Affiliations
Hendrik Steigerwald, KLA-Tencor MIE GmbH (Germany)
Oliver Ache, KLA-Tencor MIE GmbH (Germany)
Runyuan Han, KLA-Tencor MIE GmbH (Germany)
Frank Laske, KLA-Tencor MIE GmbH (Germany)
Klaus-Dieter Roeth , KLA-Tencor MIE GmbH (Germany)


Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

© SPIE. Terms of Use
Back to Top