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Proceedings Paper

Optical design of objectives for reducing photolithography
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Paper Abstract

This paper reviews the technical solutions for reduction optical photolithography systems based on the principle of obtaining a scaled-down object image. Dioptric reduction system design trends are discussed and applied technical solutions for building such systems are proposed. Genuine optical systems are offered which comply with the requirements mentioned above.

Paper Details

Date Published: 20 March 2018
PDF: 14 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 105871E (20 March 2018); doi: 10.1117/12.2301026
Show Author Affiliations
Dmitry N. Frolov, Project Labor-Microscopes (Russian Federation)
Olga A. Vinogradova, Project Labor-Microscopes (Russian Federation)
Vladimir N. Frolov, AME Enterprise (Russian Federation)
Pavel S. Vakulov, AME Enterprise (Russian Federation)

Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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