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Proceedings Paper

Tunable bandwidth for application-specific SAxP process enhancement
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Paper Abstract

Use of ArFi lithography requires application-specific tuning to maximize patterning process windows. Previous investigations into the effects of light source bandwidth on imaging performance have provided the foundation for this work by identifying significant improvements in Exposure Latitude for reduced sensitivity to dose variations. This study will focus on the increase in image contrast that 200 fm light source E95 bandwidth enables on Self- Aligned Quadruple Patterning (SAQP) and Self-Aligned Double Patterning (SADP) core features. Focus of our investigation will be the understanding of roughness and profile variation through different exposure conditions.

Paper Details

Date Published: 20 March 2018
PDF: 11 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 1058705 (20 March 2018); doi: 10.1117/12.2300511
Show Author Affiliations
Paolo Alagna, Cymer LLC (Belgium)
Will Conley, Cymer LLC (United States)
Greg Rechtsteiner, Cymer LLC (United States)
Kathleen Nafus, Tokyo Electron Europe Ltd. (Belgium)
Serge Biesemans, Tokyo Electron Europe Ltd. (Belgium)
Gian Francesco Lorusso, IMEC (Belgium)


Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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