Share Email Print
cover

Proceedings Paper

Accuracy optimization with wavelength tunability in overlay imaging technology
Author(s): Honggoo Lee; Yoonshik Kang; Sangjoon Han; Kyuchan Shim; Minhyung Hong; Seungyoung Kim; Jieun Lee; Dongyoung Lee; Eungryong Oh; Ahlin Choi; Youngsik Kim; Tal Marciano; Dana Klein; Eitan M. Hajaj; Sharon Aharon ; Guy Ben-Dov ; Saltoun Lilach; Dan Serero; Anna Golotsvan
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

As semiconductor manufacturing technology progresses and the dimensions of integrated circuit elements shrink, overlay budget is accordingly being reduced. Overlay budget closely approaches the scale of measurement inaccuracies due to both optical imperfections of the measurement system and the interaction of light with geometrical asymmetries of the measured targets. Measurement inaccuracies can no longer be ignored due to their significant effect on the resulting device yield. In this paper we investigate a new approach for imaging based overlay (IBO) measurements by optimizing accuracy rather than contrast precision, including its effect over the total target performance, using wavelength tunable overlay imaging metrology. We present new accuracy metrics based on theoretical development and present their quality in identifying the measurement accuracy when compared to CD-SEM overlay measurements. The paper presents the theoretical considerations and simulation work, as well as measurement data, for which tunability combined with the new accuracy metrics is shown to improve accuracy performance.

Paper Details

Date Published: 13 March 2018
PDF: 12 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058532 (13 March 2018); doi: 10.1117/12.2300153
Show Author Affiliations
Honggoo Lee, SK Hynix, Inc. (Korea, Republic of)
Yoonshik Kang, SK hynix, Inc. (Korea, Republic of)
Sangjoon Han, SK hynix, Inc. (Korea, Republic of)
Kyuchan Shim, SK hynix, Inc. (Korea, Republic of)
Minhyung Hong, SK hynix, Inc. (Korea, Republic of)
Seungyoung Kim, SK hynix, Inc. (Korea, Republic of)
Jieun Lee, SK hynix, Inc. (Korea, Republic of)
Dongyoung Lee, SK hynix, Inc. (Korea, Republic of)
Eungryong Oh, SK hynix, Inc. (Korea, Republic of)
Ahlin Choi, SK hynix, Inc. (Korea, Republic of)
Youngsik Kim, SK hynix, Inc. (Korea, Republic of)
Tal Marciano, KLA-Tencor Israel (Israel)
Dana Klein, KLA-Tencor Israel (Israel)
Eitan M. Hajaj, KLA-Tencor Israel (Israel)
Sharon Aharon , KLA-Tencor Israel (Israel)
Guy Ben-Dov , KLA-Tencor Israel (Israel)
Saltoun Lilach, KLA-Tencor Israel (Israel)
Dan Serero, KLA-Tencor Israel (Israel)
Anna Golotsvan, KLA-Tencor Israel (Israel)


Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

© SPIE. Terms of Use
Back to Top