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Proceedings Paper

Thin films for high-resolution, 3-color lithography
Author(s): Sandra A. Gutierrez Razo; Adam Pranda; Nikolaos Liaros; Samuel R. Cohen; John T. Fourkas; Gottlieb S. Oehrlein; Hannah M. Ogden; Amy Mullin; Steven M. Wolf; Daniel Falvey; John Petersen
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Paper Abstract

Three-color lithography (3CL) can produce high-resolution features using visible light. This technique uses one beam to pre-activate a photoresist, a second beam to deactivate it, and a third beam to activate the pre-activated regions that have not been deactivated. The deactivation beam is used to trim features, allowing for improved feature size and resolution. Although this 3CL was pioneered with 2-photon excitation, the ultimate goal is to use thin films with linear excitation, such that it is compatible with industrial requirements. We will discuss the first thin-film 3CL studies, which are a promising step towards large-area patterning.

Paper Details

Date Published: 19 March 2018
PDF: 7 pages
Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058418 (19 March 2018); doi: 10.1117/12.2299681
Show Author Affiliations
Sandra A. Gutierrez Razo, Univ. of Maryland, College Park (United States)
Adam Pranda, Univ. of Maryland, College Park (United States)
Nikolaos Liaros, Univ. of Maryland, College Park (United States)
Samuel R. Cohen, Univ. of Maryland, College Park (United States)
John T. Fourkas, Univ. of Maryland, College Park (United States)
Gottlieb S. Oehrlein, Univ. of Maryland, College Park (United States)
Hannah M. Ogden, Univ. of Maryland, College Park (United States)
Amy Mullin, Univ. of Maryland, College Park (United States)
Steven M. Wolf, Univ. of Maryland, College Park (United States)
Daniel Falvey, Univ. of Maryland, College Park (United States)
John Petersen, Univ. of Maryland, College Park (United States)
Periodic Structures, Inc. (United States)


Published in SPIE Proceedings Vol. 10584:
Novel Patterning Technologies 2018
Eric M. Panning, Editor(s)

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