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Proceedings Paper

Low-pressure plasma processing for optoelectronics applications
Author(s): Ludvik Martinu
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Paper Abstract

Low pressure plasma can effectively be used for the fabrication of films for optical waveguides and for the patterning of photonic devices. The present paper describes the basic physical and chemical processes during the plasma deposition of passive waveguides, particularly of silicon compound layers such as silicon oxide, nitride and oxynitrides. We give an overview of the effects of discharge parameters (reactor design, gas composition, energy of bombarding ions, substrate temperature) on the optical properties of the waveguide materials, and their relation to the microstructural and mechanical characteristics. Advances in plasma- fabricated photonic devices on silicon substrates are discussed.

Paper Details

Date Published: 10 January 1996
PDF: 8 pages
Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); doi: 10.1117/12.229949
Show Author Affiliations
Ludvik Martinu, Ecole Polytechnique de Montreal (Canada)


Published in SPIE Proceedings Vol. 2695:
Functional Photonic and Fiber Devices
S. Iraj Najafi; Mario Nicola Armenise, Editor(s)

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