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Proceedings Paper

Limitations of hook method in measuring sputtered atomic density in a processing plasma
Author(s): H. J. Kim
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Paper Abstract

The reliable measurement of plasma parameters such as sputtered atomic den- sity in processing plasmas is necessary to understand the fundamental physics of such plasmas and their relation to characteristics of deposited thin films. Hook interferometry is used to measure sputtered copper atomic density in a cylindrical sputtering magnetron discharge. Absolute densities have been successfully obtained as a function of radial position with small spatial density gradient. This paper will describe the application of Fourier transform techniques to analyse hook inter- ferograms and compare the limitations in measuring the atomic density with the conventional hook analysis method.

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 27785R (1 September 1996); doi: 10.1117/12.2299090
Show Author Affiliations
H. J. Kim, Univ. of Sydney (Australia)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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