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Proceedings Paper

High-efficiency second-harmonic generation of copper vapor laser and its application in sub-micron photolithography
Author(s): Hong Ren
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Paper Abstract

Three approaches available to raise the conversion efficiency of the sec- ond harmonic generation of copper vapor laser in a BBO crystal have been demonstrated. The high optical conversion efficiency, 14.4%, was achieved at 5.4-W coppor vapor laser power. Sub-micron photolithography was attained using the second harmonic light of coppor vapor laser, a new UV light at 255.3-mxi, by a 1:1 catadioptric high NA lithog- raphy lens for the first time. The resolution of lines was 0.7-pm.

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277815 (1 September 1996); doi: 10.1117/12.2298923
Show Author Affiliations
Hong Ren, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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