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Proceedings Paper

Optical imaging of small structures in optical lithography: high focal depth with optical filters.
Author(s): R. Hild
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Paper Abstract

The main goal in photolithography is to produce smaller and smaller structures with high Depth of Focus (DOF). In this contribution the image intensity of small isolated structures is studied under the influence of nonuniform pupils. Special interest is dedicated to axial apodizing filters, which produce high DOF with sufficient small line width. The influence of partial coherent illumination has been taken into account.

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277814 (1 September 1996); doi: 10.1117/12.2298922
Show Author Affiliations
R. Hild, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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