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Proceedings Paper

Catadioptric systems for sub-quarter micron lithography
Author(s): Kag Hyeong Lee
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Paper Abstract

Nowadays, ArF excimer laser projection lithography has been spot lighted due to its potential high resolution applicable to 1 G Bit DRAMs( < 0.2μm design rule ). The unique refractive material in ArF excimer laser lithography is fused silica and there is no way to correct the chromatic aberration by combination of different materials. Hence, the catadioptric configuration is inevitable in this field.[1, 2]

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277805 (1 September 1996); doi: 10.1117/12.2298887
Show Author Affiliations
Kag Hyeong Lee, Electronics and Telecommunications Research Institute (Korea, Republic of)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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