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Proceedings Paper

Multiple aperture imaging system for lithography
Author(s): R. Völkel
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Paper Abstract

An optical system will be presented which uses a stack of microlens arrays for the 1:1 imaging of extended object planes. The system is based on the well-known concept of multiple aperture imaging. A compact imaging system was discovered which is remarkable in that it provides a diffraction limited resolution of 3 μm free of distortion and magnification errors for large object and image areas. 5 μm resolution was demonstrated by using melting resist microlens arrays.

Paper Details

Date Published: 1 September 1996
PDF: 2 pages
Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277804 (1 September 1996); doi: 10.1117/12.2298886
Show Author Affiliations
R. Völkel, Institute of Microtechnology (Switzerland)


Published in SPIE Proceedings Vol. 2778:
17th Congress of the International Commission for Optics: Optics for Science and New Technology
Joon-Sung Chang; Jai-Hyung Lee; ChangHee Nam, Editor(s)

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