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Critical-dimension grazing incidence small angle x-ray scattering
Author(s): G. Freychet; D. Kumar; R. Pandolfi; D. Staacks; P. Naulleau; R. J. Kline; D. Sunday ; M. Fukuto; J. Strzalka; A. Hexemer
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Paper Abstract

With the advent of high brightness sources and fast detectors, there is a possibility for combining fast X-ray acquisition with high-speed data treatment to reach the timescale for an effective in-line characterization method. We will highlight two recent developments using Small Angle X-ray Scattering on nanoscale etched patterns: the first is the inclusion of a CD-SAXS tool, allowing the data treatment and simulations to reconstruct the form-factor, inside the Xi-cam framework; the second is the development of a high performance Grazing Incidence approach to reconstruct the shape of line profile. This study also shows the comparison between the line profiles reconstructed from both techniques as well as the profile extracted from cross-section SEM.

Paper Details

Date Published: 13 March 2018
PDF: 7 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058512 (13 March 2018); doi: 10.1117/12.2297518
Show Author Affiliations
G. Freychet, Lawrence Berkeley National Lab. (United States)
D. Kumar, Lawrence Berkeley National Lab. (United States)
R. Pandolfi, Lawrence Berkeley National Lab. (United States)
D. Staacks, Lawrence Berkeley National Lab. (United States)
P. Naulleau, Lawrence Berkeley National Lab. (United States)
R. J. Kline, National Institute of Standards and Technology (United States)
D. Sunday , National Institute of Standards and Technology (United States)
M. Fukuto, Brookhaven National Lab. (United States)
J. Strzalka, Argonne National Lab. (United States)
A. Hexemer, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

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