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Proceedings Paper

Post-decomposition optimizations using pattern matching and rule-based clustering for multi-patterning technology
Author(s): Lynn T.-N. Wang; Sriram Madhavan
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Paper Abstract

A pattern matching and rule-based polygon clustering methodology with DFM scoring is proposed to detect decomposition-induced manufacturability detractors and fix the layout designs prior to manufacturing. A pattern matcher scans the layout for pre-characterized patterns from a library. If a pattern were detected, rule-based clustering identifies the neighboring polygons that interact with those captured by the pattern. Then, DFM scores are computed for the possible layout fixes: the fix with the best score is applied. The proposed methodology was applied to two 20nm products with a chip area of 11 mm2 on the metal 2 layer. All the hotspots were resolved. The number of DFM spacing violations decreased by 7-15%.

Paper Details

Date Published: 20 March 2018
PDF: 9 pages
Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880C (20 March 2018); doi: 10.1117/12.2297508
Show Author Affiliations
Lynn T.-N. Wang, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10588:
Design-Process-Technology Co-optimization for Manufacturability XII
Jason P. Cain, Editor(s)

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