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Proceedings Paper

A tabletop coherent EUV source for commercial EUVL metrology and imaging applications
Author(s): Xiaoshi Zhang; Jon Garlick; Eric Mountfort; Henry Kapteyn
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Paper Abstract

We present performance characterization for KMLabs’ high harmonic generation (HHG) -based 13.5 nm EUV source, the XUUS4 TM. This source meets critical specifications for metrology and imaging applications, including in its long-term stability, and has been applied to ultrahigh resolution coherent diffractive imaging at 13.5 nm.

Paper Details

Date Published: 19 March 2018
PDF: 2 pages
Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831C (19 March 2018); doi: 10.1117/12.2297507
Show Author Affiliations
Xiaoshi Zhang, Kapteyn-Murnane Labs., Inc. (United States)
Jon Garlick, Kapteyn-Murnane Labs., Inc. (United States)
Eric Mountfort, Kapteyn-Murnane Labs., Inc. (United States)
Henry Kapteyn, Kapteyn-Murnane Labs., Inc. (United States)


Published in SPIE Proceedings Vol. 10583:
Extreme Ultraviolet (EUV) Lithography IX
Kenneth A. Goldberg, Editor(s)

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