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Proceedings Paper

Integrated manufacturing flow for selective-etching SADP/SAQP
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Paper Abstract

Printing cut mask in SAMP (Self Aligned Multi Patterning) is very challenging at advanced nodes. One of the proposed solutions is to print the cut shapes selectively. Which means the design is decomposed into mandrel tracks, Mandrel cuts and non-Mandrel cuts. The mandrel and non-Mandrel cuts are mutually independent which results in relaxing spacing constrains and as a consequence more dense metal lines. In this paper, we proposed the manufacturing flow of selective etching process. The results are quantified in terms of measuring PVBand, EPE and the number of hard bridging and pinching across the layout.

Paper Details

Date Published: 20 March 2018
PDF: 12 pages
Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880Q (20 March 2018); doi: 10.1117/12.2297415
Show Author Affiliations
Rehab Kotb Ali, Mentor Graphics Egypt (Egypt)
Ahmed Hamed Fatehy, Mentor Graphics Egypt (Egypt)
James Word, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 10588:
Design-Process-Technology Co-optimization for Manufacturability XII
Jason P. Cain, Editor(s)

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