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Proceedings Paper

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
Author(s): P. Pimenta-Barros; G. Claveau; M. Argoud; Z. Chalupa; N. Allouti; C. Comboroure; G. Chamiot-Maitral; N. Posseme; L. Pain; R. Tiron; C. Navarro; C. Nicolet; I. Cayrefourcq
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Paper Abstract

Directed Self Assembly (DSA) of block-copolymers (BCPs) is considered as a cost-effective solution to extend the performances of conventional lithography. In this work, we propose a smart surface modification technique to precisely control the surface affinity of guiding template used in the DSA graphoepitaxy process flows. The presented method consists in the UV irradiation of copolymers brushes in order to locally tune their surface affinity. By this way, we are able to differentiate the surface affinities of guide sidewalls (PMMA-attractive) and guide bottom (non-preferential affinity). A complete DSA-module is demonstrated and implemented on a 300mm integration flow dedicated to the creation of silicon nanowires-like transistor.

Paper Details

Date Published: 19 March 2018
PDF: 9 pages
Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840C (19 March 2018); doi: 10.1117/12.2297407
Show Author Affiliations
P. Pimenta-Barros, CEA-LETI (France)
G. Claveau, CEA-LETI (France)
M. Argoud, CEA-LETI (France)
Z. Chalupa, CEA-LETI (France)
N. Allouti, CEA-LETI (France)
C. Comboroure, CEA-LETI (France)
G. Chamiot-Maitral, CEA-LETI (France)
N. Posseme, CEA-LETI (France)
L. Pain, CEA-LETI (France)
R. Tiron, CEA-LETI (France)
C. Navarro, Arkema France (France)
C. Nicolet, Arkema France (France)
I. Cayrefourcq, Arkema France (France)


Published in SPIE Proceedings Vol. 10584:
Novel Patterning Technologies 2018
Eric M. Panning, Editor(s)

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