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Proceedings Paper

Toward reliable and repeatable automated STEM-EDS metrology with high throughput
Author(s): Zhenxin Zhong; Jason Donald; Gavin Dutrow; Justin Roller; Ozan Ugurlu; Martin Verheijen; Oleksii Bidiuk
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Paper Abstract

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Paper Details

Date Published: 13 March 2018
PDF: 8 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105852X (13 March 2018); doi: 10.1117/12.2297403
Show Author Affiliations
Zhenxin Zhong, Thermo Fisher Scientific (United States)
Jason Donald, Thermo Fisher Scientific (United States)
Gavin Dutrow, Thermo Fisher Scientific (United States)
Justin Roller, Thermo Fisher Scientific (United States)
Ozan Ugurlu, Thermo Fisher Scientific (United States)
Martin Verheijen, Thermo Fisher Scientific (Netherlands)
Oleksii Bidiuk, Thermo Fisher Scientific (Netherlands)


Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

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